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TERMİYONİK VAKUM ARK KULLANARAK AL2 O3 İNCE FİLM DEPOLAMA

Al2 O3 THIN FILM DEPOSITION USING THERMIONIC VACUUM ARC

Journal Name:

  • Sigma Mühendislik ve Fen Bilimleri Dergisi

Publication Year:

  • 2005

Key Words:

Keywords (Original Language):

Author NameUniversity of Author
Abstract (2. Language): 
The thermionic vacuum arc (TVA) is a new technique for the deposition of thin metallic and nonmetallic films. TVA discharge is established in vacuum between a heated cathode (a tungsten filament) and an anode (a tungsten crucible filled with Al2 O3 pellets). TVA discharges in Al2 O3 vapors were generated and thin Al2 O3 films were deposited on the glass substrates using TVA. The surfaces of thin Al2 O3 films were examined using a Metallurgical Optical Microscope (MOM) and Scanning Electron Microscope (SEM). Al2 O3 thin films have been analyzed using X-ray diffraction (XRD) method.
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Abstract (Original Language): 
Termiyonik Vakum Ark (TVA), ince metal ve metal olmayan filmlerin depolanması için yeni bir tekniktir. TVA deşarj, vakum içinde ısıtılmış bir katot (tungsten flament) ve anot (Al2 O3 parçacıkları ile dolu tungsten pota) arasında meydana gelir. Al2 O3 buharlarında TVA deşarjlar üretildi ve ince Al2 O3 filmleri cam tabanlar üzerine TVA kullanılarak depolanıldı. İnce Al2 O3 filmlerin yüzeyleri Metalurjik Optik Mikroskop (MOM) ve Taramalı Elektron Mikroskobu ile analiz edildi. Al2 O3 ince filmleri X-ışını difraksiyon metodu ile incelenildi.
FULL TEXT (PDF): 
PDF icon arastrmx_845_23_pp_18-23.pdf
  • 3
18-23
  • Turkish

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